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Chinese National Standard Category: Semimetal and semiconductor material in general

English Title: Thickness determination for silicon epitaxial layers - Stacking fault method
Chinese Title: 硅外延层厚度测定 堆垛层错尺寸法
Standard No.: YS/T 23-1992
Category No.: H80
Issued by: China Nonferrous Metals Industry Corporation
Issued on: 1992-3-9
Implemented on: 1993-1-1
Status: superseded
Superseded by:YS/T 23-2016 Test method for thickness of epitaxial layers-Stacking fault size
Superseded on:2016-9-1
Abolished on:
Superseding:
Word Count:2000 words
Similar Standards: GB/T 37051-2018   GB/T 29507-2013   GB/T 29057-2023   GB/T 16596-2019   GB/T 16595-2019   GB/T 14844-2018   GB/T 8756-2018   GB/T 34479-2017   GB/T 32279-2015   YS/T 985-2014   GB/T 30453-2013   GB/T 14863-2013   GB/T 30110-2013   GB/T 29505-2013   GB/T 29057-2012   YS/T 838-2012   GB/T 26069-2010   GB/T 26071-2010   GB/T 26068-2010   GB/T 14847-2010  
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