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| International Standard Category: Semiconducting materials |
GB/T 14847-2010 Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance
重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法;
| Category No.: | 29.045 | Valid Status: | valid |
| Issued Organization: | AQSIQ;SAC | Issued Date: | 2011-1-10 |
| Implemented Date: | 2011-10-1 | Abolished Date: | |
| Superseded Standard.: | Superseded Date: |
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