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| Chinese National Standard Category: Metal nondestructive testing method |
| English Title: | method for crystallographic perfection of epitaxial layers in silicon by etching techniques |
| Chinese Title: | 硅外延层晶体完整性检验方法 腐蚀法 |
| Standard No.: | GB/T 14142-1993 |
| Category No.: | H26 |
| Issued by: | AQSIQ |
| Issued on: | 1993-2-6 |
| Implemented on: | 1993-10-1 |
| Status: | superseded |
| Superseded by: | GB/T 14142-2017 Test method for crystallographic perfection of epitaxial layers in silicon—Etching technique |
| Superseded on: | 2018-4-1 |
| Abolished on: | |
| Superseding: | |
| Word Count: | 2500 words |
| Similar Standards: | DB32/T 4485-2023 GB/T 14143-1993 GB/T 4058-1995 GB 246-1982 SDJ 67-1983 T/CIRA 14-2020 GB/T 242-1982 GB/T 3310-2023 NB/T 47013.14-2023 NB/T 47013.11-2023 GB/T 11260-2023 GB/T 42662-2023 GB/T 42673-2023 GB/T 42664-2023 GB/T 20490-2023 GB/T 42677-2023 GB/T 41966-2022 GB/T 4162-2022 GB/T 40791-2021 GB/T 40385-2021 |
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