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| Chinese National Standard Category: Semimetal and semiconductor material analysis method |
| English Title: | Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy |
| Chinese Title: | 硅片表面金属沾污的全反射X光荧光光谱测试方法 |
| Standard No.: | GB/T 24578-2015 |
| Category No.: | H17 |
| Issued by: | AQSIA AND SAC |
| Issued on: | 2015-12-10 |
| Implemented on: | 2017-1-1 |
| Status: | valid |
| Superseded by: | |
| Superseded on: | |
| Abolished on: | |
| Superseding: | GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy |
| Word Count: | 7500 words |
| Similar Standards: | GB/T 1558-2023 GB/T 35306-2023 GB/T 24582-2023 GB/T 42263-2022 GB/T 42276-2022 GB/T 42274-2022 GB/T 24581-2022 GB/T 41153-2021 GB/T 39145-2020 GB/T 39144-2020 GB/T 38976-2020 GB/T 37385-2019 GB/T 37211.2-2018 GB/T 37211.1-2018 GB/T 4059-2018 GB/T 1557-2018 GB/T 4060-2018 GB/T 37049-2018 GB/T 35309-2017 GB/T 35306-2017 |
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