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Chinese National Standard Category: Semimetal and semiconductor material analysis method

English Title: Characterization of subsurface damage in polished compound semiconductor wafers by reflectance difference spectroscopy method
Chinese Title: 化合物半导体抛光晶片亚表面损伤的反射差分谱测试方法
Standard No.: GB/T 26070-2010
Category No.: H17
Issued by: AQSIQ
Issued on: 2011-1-10
Implemented on: 2011-10-1
Status: valid
Superseded by:
Superseded on:
Abolished on:
Superseding:
Word Count:8000 words
Similar Standards: GB/T 1558-2023   GB/T 35306-2023   GB/T 24582-2023   GB/T 42263-2022   GB/T 42276-2022   GB/T 42274-2022   GB/T 24581-2022   GB/T 41153-2021   GB/T 39145-2020   GB/T 39144-2020   GB/T 38976-2020   GB/T 37385-2019   GB/T 37211.2-2018   GB/T 37211.1-2018   GB/T 4059-2018   GB/T 1557-2018   GB/T 4060-2018   GB/T 37049-2018   GB/T 35309-2017   GB/T 35306-2017  
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