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| Chinese National Standard Category: Elemental semiconductor material |
| English Title: | Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method |
| Chinese Title: | 硅外延层和扩散层厚度测定 磨角染色法 |
| Standard No.: | YS/T 15-1991 |
| Category No.: | H82 |
| Issued by: | 0 |
| Issued on: | |
| Implemented on: | 1992-6-1 |
| Status: | superseded |
| Superseded by: | YS/T 15-2015 Test method for thickness of epitaxial layers and diffused layers by angle lap stain |
| Superseded on: | 2015-10-1 |
| Abolished on: | |
| Superseding: | |
| Word Count: | 3000 words |
| Similar Standards: | GB/T 35307-2023 GB/T 12963-2022 GB/T 41652-2022 GB/T 26069-2022 GB/T 41325-2022 GB/T 14139-2019 GB/T 29054-2019 GB/T 29055-2019 GB/T 5238-2019 GB/T 12965-2018 GB/T 25076-2018 GB/T 12964-2018 GB/T 26071-2018 GB/T 35307-2017 GB/T 35310-2017 GB/T 12962-2015 GB/T 32573-2016 GB/T 31854-2015 YS/T 1061-2015 GB/T 12963-2014 |
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