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Chinese National Standard Category: Semimetal and semiconductor material analysis method

English Title: Methods for chemical analysis of arsenic The dithiodiantipyryl methane photometric method for the determination of kismuth content
Chinese Title: 砷化学分析方法 二硫代二安替吡啉基甲烷光度法测定铋量
Standard No.: YS/T 519.4-2006
Category No.: H17
Issued by:
Issued on: 2006-07-27
Implemented on: 2006-10-11
Status: superseded
Superseded by:YS/T 519.4-2009 Methods for chemical analysis of arsenic Part 4: Determination of bismuth antimony and sulfur content-Inductively coupled plasma atomic emission spectrometry
Superseded on:2010-6-1
Abolished on:
Superseding:GB/T 4373.4-1984 Methods for chemical analysis of arsenic;The dithio-diantipyrylmethane photometric method for the determination of bismuth content
Word Count:1000 words
Similar Standards: GB/T 1558-2023   GB/T 35306-2023   GB/T 24582-2023   GB/T 42263-2022   GB/T 42276-2022   GB/T 42274-2022   GB/T 24581-2022   GB/T 41153-2021   GB/T 39145-2020   GB/T 39144-2020   GB/T 38976-2020   GB/T 37385-2019   GB/T 37211.2-2018   GB/T 37211.1-2018   GB/T 4059-2018   GB/T 1557-2018   GB/T 4060-2018   GB/T 37049-2018   GB/T 35309-2017   GB/T 35306-2017  
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