Code of China Chinese Standard Classification Professional Classification ICS Classification Latest
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Standard No. Title Price(USD) Delivery Status Add to Cart
GB/T 16596-1996 Specification for establishing a wafer coordinate system $75.00 via email in 1~3 business day superseded
GB/T 16596-2019 Specification for establishing a wafer coordinate system $80.00 via email in 1~3 business day valid
GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection $380.00 via email in 1~3 business day abolished
GB/T 17170-1997 Test method for deep level EL2 concentration of undoped semi-insulating monocrystal gallium arsenide by measurement infrared absorption method $90.00 via email in 1~3 business day superseded
GB/T 19199-2003 Test method for carbon concentration of semi-insulating monocrystal gallium arsenide by measurement infrared absorption method $90.00 via email in 1~3 business day superseded
GB/T 20228-2006 Gallium arsenide single crystal $124.00 via email in 1~3 business day abolished
GB/T 20228-2021 Gallium arsenide single crystal $170.00 via email in 1~3 business day valid
GB/T 20229-2006 Gallium phosphide single crystal $124.00 via email in 1~3 business day abolished
GB/T 20229-2022 Gallium phosphide single crystal $200.00 via email in 1~3 business day valid
GB/T 20230-2006 Indium phosphide single crystal $140.00 via email in 1~3 business day abolished
GB/T 20230-2022 Indium phosphide single crystal $255.00 via email in 1~3 business day valid
GB/T 24574-2009 Test methods for photoluminescence analysis of single crystal silicon for Ⅲ-Ⅴ impurities $210.00 via email in 1~3 business day valid
GB/T 24576-2009 Test method for measuring the Al fraction in AlGaAs on GaAs substrates by high resolution X-ray diffraction $170.00 via email in 1~3 business day valid
GB/T 24577-2009 Test methods for analyzing organic contaminants on silicon wafer surfaces by thermal desorption gas chromatography $210.00 via email in 1~3 business day valid
GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy $210.00 via email in 1~3 business day superseded
GB/T 24579-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-atomic absorption spectroscopy $210.00 via email in 1~3 business day valid
GB/T 24580-2009 Test method for measuring Boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry $180.00 via email in 1~3 business day valid
GB/T 24581-2009 Test method for low temperature FT-IR analysis of single crystal silicon for Ⅲ-Ⅴ impurities $170.00 via email in 1~3 business day superseded
GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry $120.00 via email in 1~3 business day superseded
GB/T 25074-2010 Solar-grade polycrystalline silicon $120.00 via email in 1~3 business day superseded
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