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| Position: Chinese Standard in English/GB/T 14847-1993 |
| GB/T 14847-1993 Test method for thickness of lightly doped silicon eqitaxial layers on heavily doped silicon substrates by infrared reflectance (English Version) | |||
| Standard No.: | GB/T 14847-1993 | Status: | superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 3500 words | Translation Price(USD): | 300.0 remind me the price change |
| Implemented on: | 1994-9-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 14847-1993 |
| English Name: | Test method for thickness of lightly doped silicon eqitaxial layers on heavily doped silicon substrates by infrared reflectance |
| Chinese Name: | 重掺杂衬底上轻掺杂硅外延层厚度的红外反射测量方法 |
| Chinese Classification: | H21 Metal physical property test method |
| Professional Classification: | GB National Standard |
| Source Content Issued by: | SBTS |
| Issued on: | 1993-01-02 |
| Implemented on: | 1994-9-1 |
| Status: | superseded |
| Superseded by: | GB/T 14847-2010 Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance |
| Superseded on: | 2011-10-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 3500 words |
| Translation Price(USD): | 300.0 |
| Delivery: | via email in 1~3 business day |