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Position: Chinese Standard in English/GB/T 15862-2012
GB/T 15862-2012   General specification of ion implantation equipment (English Version)
Standard No.: GB/T 15862-2012 Status:valid remind me the status change

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Target Language:English File Format:PDF
Word Count: 7000 words Translation Price(USD):210.0 remind me the price change

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Implemented on:2013-2-15 Delivery: via email in 1~3 business day

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Standard No.: GB/T 15862-2012
English Name: General specification of ion implantation equipment
Chinese Name: 离子注入机通用规范
Chinese Classification: L97    Dedicated processing equipment
Professional Classification: GB    National Standard
Source Content Issued by: AQSIQ;SAC
Issued on: 2012-11-5
Implemented on: 2013-2-15
Status: valid
Superseding:GB/T 15862-1995 Generic specification for ion implantation equipment
Target Language: English
File Format: PDF
Word Count: 7000 words
Translation Price(USD): 210.0
Delivery: via email in 1~3 business day
本标准规定了离子注入机的术语、产品分类、技术要求、试验、检验规则和标志、包装、运输、贮存。
本标准适用于半导体工艺用电能离子注入机。其他离子注入机亦可参照使用。
Code of China
Standard
GB/T 15862-2012  General specification of ion implantation equipment (English Version)
Standard No.GB/T 15862-2012
Statusvalid
LanguageEnglish
File FormatPDF
Word Count7000 words
Price(USD)210.0
Implemented on2013-2-15
Deliveryvia email in 1~3 business day
Detail of GB/T 15862-2012
Standard No.
GB/T 15862-2012
English Name
General specification of ion implantation equipment
Chinese Name
离子注入机通用规范
Chinese Classification
L97
Professional Classification
GB
ICS Classification
Issued by
AQSIQ;SAC
Issued on
2012-11-5
Implemented on
2013-2-15
Status
valid
Superseded by
Superseded on
Abolished on
Superseding
GB/T 15862-1995 Generic specification for ion implantation equipment
Language
English
File Format
PDF
Word Count
7000 words
Price(USD)
210.0
Keywords
GB/T 15862-2012, GB 15862-2012, GBT 15862-2012, GB/T15862-2012, GB/T 15862, GB/T15862, GB15862-2012, GB 15862, GB15862, GBT15862-2012, GBT 15862, GBT15862
Introduction of GB/T 15862-2012
本标准规定了离子注入机的术语、产品分类、技术要求、试验、检验规则和标志、包装、运输、贮存。
本标准适用于半导体工艺用电能离子注入机。其他离子注入机亦可参照使用。
Contents of GB/T 15862-2012
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Keywords:
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