GB/T 19444-2004 English Version, GB/T 19444-2004 Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction (English Version)

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GB/T 19444-2004 Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction (English Version)
Standard No.:	GB/T 19444-2004	Status:	valid remind me the status change Email:
Language:	English	File Format:	PDF
Word Count:	3000 words	Price(USD):	85.0 remind me the price change Email:
Implemented on:	2004-7-1	Delivery:	via email in 1~3 business day

Standard No.:	GB/T 19444-2004
English Name:	Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction
Chinese Name:	硅片氧沉淀特性的测定-间隙氧含量减少法
Chinese Classification:	H26 Metal nondestructive testing method
Professional Classification:	GB National Standard
ICS Classification:	29.040.01 29.040.01 Insulating fluids in general 29.040.01
Issued by:	AQSIQ;SAC
Issued on:	2004-2-5
Implemented on:	2004-7-1
Status:	valid
Language:	English
File Format:	PDF
Word Count:	3000 words
Price(USD):	85.0
Delivery:	via email in 1~3 business day

Standard

GB/T 19444-2004 Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction (English Version)
Standard No.	GB/T 19444-2004
Status	valid
Language	English
File Format	PDF
Word Count	3000 words
Price(USD)	85.0
Implemented on	2004-7-1
Delivery	via email in 1~3 business day

Detail of GB/T 19444-2004

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Introduction of GB/T 19444-2004

本标准规定了由测量硅片间隙氧含量的减少量来检验硅片氧沉淀特性的方法原理、取样规则、热处理程序、试验步骤、数据计算等内容。本标准用于定性比较两批或多批集成电路用硅片间隙氧沉淀特性。

Contents of GB/T 19444-2004

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