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| Position: Chinese Standard in English/GB/T 24578-2015 |
| GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy (English Version) | |||
| Standard No.: | GB/T 24578-2015 | Status: | to be superseded remind me the status change |
| Language: | English | File Format: | |
| Word Count: | 7500 words | Price(USD): | 210.0 remind me the price change |
| Implemented on: | 2017-1-1 | Delivery: | via email in 1~3 business day |
| Standard No.: | GB/T 24578-2015 |
| English Name: | Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy |
| Chinese Name: | 硅片表面金属沾污的全反射X光荧光光谱测试方法 |
| Chinese Classification: | H17 Semimetal and semiconductor material analysis method |
| Professional Classification: | GB National Standard |
| Issued by: | AQSIA AND SAC |
| Issued on: | 2015-12-10 |
| Implemented on: | 2017-1-1 |
| Status: | to be superseded |
| Superseded by: | GB/T 24578-2024 Test method for measuring surface metal contamination on semiconductor wafers - Total reflection X-Ray fluorescence spectroscopy |
| Superseded on: | 2025-2-1 |
| Superseding: | GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy |
| Language: | English |
| File Format: | |
| Word Count: | 7500 words |
| Price(USD): | 210.0 |
| Delivery: | via email in 1~3 business day |