GB/T 34900-2017 English Version, GB/T 34900-2017 Micro-electromechanical system technology-Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer (English Version)

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GB/T 34900-2017 Micro-electromechanical system technology-Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer (English Version)
Standard No.:	GB/T 34900-2017	Status:	valid remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	7500 words	Translation Price(USD):	220.0 remind me the price change Email:
Implemented on:	2018-5-1	Delivery:	via email in 1~3 business day

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Standard No.:	GB/T 34900-2017
English Name:	Micro-electromechanical system technology-Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer
Chinese Name:	微机电系统（MEMS）技术基于光学干涉的MEMS微结构残余应变测量方法
Chinese Classification:	L55 Microcircuit in general
Professional Classification:	GB National Standard
Source Content Issued by:	AQSIQ; SAC
Issued on:	2017-11-01
Implemented on:	2018-5-1
Status:	valid
Target Language:	English
File Format:	PDF
Word Count:	7500 words
Translation Price(USD):	220.0
Delivery:	via email in 1~3 business day

Standard

GB/T 34900-2017 Micro-electromechanical system technology-Measuring method for residual strain measurements of MEMS microstructures using an optical interferometer (English Version)
Standard No.	GB/T 34900-2017
Status	valid
Language	English
File Format	PDF
Word Count	7500 words
Price(USD)	220.0
Implemented on	2018-5-1
Delivery	via email in 1~3 business day

Detail of GB/T 34900-2017

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Introduction of GB/T 34900-2017

本标准规定了基于光学干涉显微镜获取的微双端固支梁结构表面形貌进行残余应变测量的方法。
本标准适用于表面反射率不低于4%且使用光学干涉显微镜能够获取表面形貌的微双端固支梁结构。

Contents of GB/T 34900-2017

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