Standard No.:	GB/T 40110-2021
English Name:	Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Chinese Name:	表面化学分析 全反射X射线荧光光谱法（TXRF）测定硅片表面元素污染
Chinese Classification:	G04    Basic standards and general methods
Professional Classification:	GB    National Standard
ICS Classification:	71.040.40 71.040.40    Chemical analysis 71.040.40
Issued by:	SAMR, SAC
Issued on:	2021-05-21
Implemented on:	2021-12-1
Status:	valid
Language:	English
File Format:	PDF
Word Count:	12500 words
Price(USD):	450.0
Delivery:	via email in 1~5 business day

本文件描述了测量经化学机械抛光或外延生长的硅片上表面元素污染的原子表面密度的TXRF方法。
本文件适用于以下情形：
——原子序数从16（S）到92（U）的元素；
——原子表面密度介于1×1010 atoms/cm2~1×1014 atoms/cm2之间的污染元素；
——采用VPD（气相分解）样品制备方法得到的原子表面密度介于5×108 atoms/cm2~5×1012 atoms/cm2之间的污染元素（见3.4）。