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Position: Chinese Standard in English/GB/T 43894.1-2024 |
GB/T 43894.1-2024 Practice for determining semiconductor wafer near-edge geometry—Part 1:Measured height data array using a curvature metric(ZDD) (English Version) | |||
Standard No.: | GB/T 43894.1-2024 | Status: | valid remind me the status change |
Language: | English | File Format: | |
Word Count: | 6500 words | Price(USD): | 195.00 remind me the price change |
Implemented on: | 2024-11-1 | Delivery: | via email in 1~3 business day |
Standard No.: | GB/T 43894.1-2024 |
English Name: | Practice for determining semiconductor wafer near-edge geometry—Part 1:Measured height data array using a curvature metric(ZDD) |
Chinese Name: | 半导体晶片近边缘几何形态评价 第1部分:高度径向二阶导数法(ZDD) |
Chinese Classification: | H21 Metal physical property test method |
Professional Classification: | GB National Standard |
Issued by: | SAMR; SAC |
Issued on: | 2024-4-25 |
Implemented on: | 2024-11-1 |
Status: | valid |
Language: | English |
File Format: | |
Word Count: | 6500 words |
Price(USD): | 195.00 |
Delivery: | via email in 1~3 business day |
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Keywords: | ||
GB/T 43894.1-2024, GB 43894.1-2024, GBT 43894.1-2024, GB/T43894.1-2024, GB/T 43894.1, GB/T43894.1, GB43894.1-2024, GB 43894.1, GB43894.1, GBT43894.1-2024, GBT 43894.1, GBT43894.1 |