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| T/CEMIA 036-2023 High alkali concentration negative photoresist developer for semiconductor display (English Version) |
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Detail of T/CEMIA 036-2023
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Introduction of T/CEMIA 036-2023
本文件适用于由氢氧化钾、表面活性剂和水组成，其中氢氧化钾的质量百分比大于8%的半导体显示用高碱浓度负胶显影液。
此半导体显示用高碱浓度负胶显影液主要用于半导体制程中负性光刻胶的显影，及薄膜晶体管液晶显示器（TFT-LCD）或有机发光二极管显示器（OLED）彩膜工艺光刻胶的显影。
Contents of T/CEMIA 036-2023