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Position: Chinese Standard in English/YS/T 719-2009
YS/T 719-2009   Flat magneting sputtering target—Silicon target for optical coating (English Version)
Standard No.: YS/T 719-2009 Status:valid remind me the status change

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Target Language:English File Format:PDF
Word Count: 3000 words Translation Price(USD):140.0 remind me the price change

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Implemented on:2010-6-1 Delivery: via email in 1~3 business day

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Standard No.: YS/T 719-2009
English Name: Flat magneting sputtering target—Silicon target for optical coating
Chinese Name: 平面磁控溅射靶材 光学薄膜用硅靶
Chinese Classification: H63    Rare refractory metals and their compounds
Professional Classification: YS    Professional Standard - Non-ferrous Metal
ICS Classification: 77.150.99 77.150.99    Other products of non-ferrous metals 77.150.99
Source Content Issued by: NDRC
Issued on: 2009-12-4
Implemented on: 2010-6-1
Status: valid
Target Language: English
File Format: PDF
Word Count: 3000 words
Translation Price(USD): 140.0
Delivery: via email in 1~3 business day
本标准规定了平面磁控溅射光学薄膜用硅靶材的要求、试验方法、检验规则、标志、包装、运输、贮存及订货单(或合同)内容。
本标准适用于平面磁控溅射光学薄膜用硅靶材。
Code of China
Standard
YS/T 719-2009  Flat magneting sputtering target—Silicon target for optical coating (English Version)
Standard No.YS/T 719-2009
Statusvalid
LanguageEnglish
File FormatPDF
Word Count3000 words
Price(USD)140.0
Implemented on2010-6-1
Deliveryvia email in 1~3 business day
Detail of YS/T 719-2009
Standard No.
YS/T 719-2009
English Name
Flat magneting sputtering target—Silicon target for optical coating
Chinese Name
平面磁控溅射靶材 光学薄膜用硅靶
Chinese Classification
H63
Professional Classification
YS
ICS Classification
Issued by
NDRC
Issued on
2009-12-4
Implemented on
2010-6-1
Status
valid
Superseded by
Superseded on
Abolished on
Superseding
Language
English
File Format
PDF
Word Count
3000 words
Price(USD)
140.0
Keywords
YS/T 719-2009, YS 719-2009, YST 719-2009, YS/T719-2009, YS/T 719, YS/T719, YS719-2009, YS 719, YS719, YST719-2009, YST 719, YST719
Introduction of YS/T 719-2009
本标准规定了平面磁控溅射光学薄膜用硅靶材的要求、试验方法、检验规则、标志、包装、运输、贮存及订货单(或合同)内容。
本标准适用于平面磁控溅射光学薄膜用硅靶材。
Contents of YS/T 719-2009
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Keywords:
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