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| Position: Chinese Standard in English/GB 6621-1986 |
| GB 6621-1986 Standard method for measuring surface flatness of polished silicon wafers by noncontact technique (English Version) | |||
| Standard No.: | GB 6621-1986 | Status: | superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 2500 words | Translation Price(USD): | 220.0 remind me the price change |
| Implemented on: | 1987-7-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB 6621-1986 |
| English Name: | Standard method for measuring surface flatness of polished silicon wafers by noncontact technique |
| Chinese Name: | 硅抛光片表面平整度的非接触式测试方法 |
| Chinese Classification: | H26 Metal nondestructive testing method |
| Professional Classification: | GB National Standard |
| Implemented on: | 1987-7-1 |
| Status: | superseded |
| Superseded by: | GB/T 6621-1995 Test methods for surface flatness of silicon polished slices |
| Superseded on: | 1995-1-2 |
| Target Language: | English |
| File Format: | |
| Word Count: | 2500 words |
| Translation Price(USD): | 220.0 |
| Delivery: | via email in 1~3 business day |