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Position: Chinese Standard in English/GB/T 6621-1995
GB/T 6621-1995   Test methods for surface flatness of silicon polished slices (English Version)
Standard No.: GB/T 6621-1995 Status:superseded remind me the status change

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Target Language:English File Format:PDF
Word Count: 5000 words Translation Price(USD):150.0 remind me the price change

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Implemented on:1995-1-2 Delivery: via email in 1~3 business day

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,2010-6-1,1995-1-2,DA7EB1C86AB74F101422616449223
Standard No.: GB/T 6621-1995
English Name: Test methods for surface flatness of silicon polished slices
Chinese Name: 硅抛光片表面平整度测试方法
Chinese Classification: H21    Metal physical property test method
Professional Classification: GB    National Standard
Source Content Issued by: STSB
Issued on: 1995-04-18
Implemented on: 1995-1-2
Status: superseded
Superseded by:GB/T 6621-2009 Testing methods for surface flatness of silicon slices
Superseded on:2010-6-1
Superseding:GB 6621-1986 Standard method for measuring surface flatness of polished silicon wafers by noncontact technique
Target Language: English
File Format: PDF
Word Count: 5000 words
Translation Price(USD): 150.0
Delivery: via email in 1~3 business day
本标准规定了用相干光的干涉现象测量硅抛光片表面平整度的方法。本标准适用于检测硅抛光片的表面平整度,也适用于检测硅外延片和类镜面状半导体晶片的表面平整度。
Code of China
Standard
GB/T 6621-1995  Test methods for surface flatness of silicon polished slices (English Version)
Standard No.GB/T 6621-1995
Statussuperseded
LanguageEnglish
File FormatPDF
Word Count5000 words
Price(USD)150.0
Implemented on1995-1-2
Deliveryvia email in 1~3 business day
Detail of GB/T 6621-1995
Standard No.
GB/T 6621-1995
English Name
Test methods for surface flatness of silicon polished slices
Chinese Name
硅抛光片表面平整度测试方法
Chinese Classification
H21
Professional Classification
GB
ICS Classification
Issued by
STSB
Issued on
1995-04-18
Implemented on
1995-1-2
Status
superseded
Superseded by
GB/T 6621-2009 Testing methods for surface flatness of silicon slices
Superseded on
2010-6-1
Abolished on
Superseding
GB 6621-1986 Standard method for measuring surface flatness of polished silicon wafers by noncontact technique
Language
English
File Format
PDF
Word Count
5000 words
Price(USD)
150.0
Keywords
GB/T 6621-1995, GB 6621-1995, GBT 6621-1995, GB/T6621-1995, GB/T 6621, GB/T6621, GB6621-1995, GB 6621, GB6621, GBT6621-1995, GBT 6621, GBT6621
Introduction of GB/T 6621-1995
本标准规定了用相干光的干涉现象测量硅抛光片表面平整度的方法。本标准适用于检测硅抛光片的表面平整度,也适用于检测硅外延片和类镜面状半导体晶片的表面平整度。
Contents of GB/T 6621-1995
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Keywords:
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