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| Position: Chinese Standard in English/GB 6623-1986 |
| GB 6623-1986 Standard method for measuring the surface O. S. F of polished silicon wafers (English Version) | |||
| Standard No.: | GB 6623-1986 | Status: | superseded remind me the status change |
| Language: | English | File Format: | |
| Word Count: | 2000 words | Price(USD): | 180.0 remind me the price change |
| Implemented on: | 1987-7-1 | Delivery: | via email in 1~3 business day |
| Standard No.: | GB 6623-1986 |
| English Name: | Standard method for measuring the surface O. S. F of polished silicon wafers |
| Chinese Name: | 硅抛光片表面热氧化层错的测试方法 |
| Chinese Classification: | H26 Metal nondestructive testing method |
| Professional Classification: | GB National Standard |
| Implemented on: | 1987-7-1 |
| Status: | superseded |
| Superseded by: | GB/T 4058-1995 Test method for detection of oxidation induced defects in polished silicon wafers |
| Superseded on: | 1995-1-2 |
| Language: | English |
| File Format: | |
| Word Count: | 2000 words |
| Price(USD): | 180.0 |
| Delivery: | via email in 1~3 business day |