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| Position: Chinese Standard in English/GB/T 41325-2022 |
| GB/T 41325-2022 Low density crystal originated pit polished monocrystalline silicon wafers for integrated circuit (English Version) | |||
| Standard No.: | GB/T 41325-2022 | Status: | valid remind me the status change |
| Language: | English | File Format: | |
| Word Count: | 5500 words | Price(USD): | 165.0 remind me the price change |
| Implemented on: | 2022-10-1 | Delivery: | via email in 1~3 business day |
| Standard No.: | GB/T 41325-2022 |
| English Name: | Low density crystal originated pit polished monocrystalline silicon wafers for integrated circuit |
| Chinese Name: | 集成电路用低密度晶体原生凹坑硅单晶抛光片 |
| Chinese Classification: | H82 Elemental semiconductor material |
| Professional Classification: | GB National Standard |
| ICS Classification: | 29.045 Semiconducting materials |
| Issued by: | SAMR; SAC |
| Issued on: | 2022-03-09 |
| Implemented on: | 2022-10-1 |
| Status: | valid |
| Language: | English |
| File Format: | |
| Word Count: | 5500 words |
| Price(USD): | 165.0 |
| Delivery: | via email in 1~3 business day |