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JC/T 2133-2012   Determination of impurities in silica sol for polishing solution in semiconductor industry—Inductively coupled plasma atomic emission spectrometric method (English Version)
Standard No.: JC/T 2133-2012 Status:valid remind me the status change
Language:English File Format:PDF
Word Count: 4000 words Price(USD):120.0 remind me the price change
Implemented on:2013-6-1 Delivery: via email in 1~3 business day
Standard No.: JC/T 2133-2012
English Name: Determination of impurities in silica sol for polishing solution in semiconductor industry—Inductively coupled plasma atomic emission spectrometric method
Chinese Name: 半导体抛光液用硅溶胶中杂质元素含量的测定 -电感耦合等离子体原子发射光谱法
Chinese Classification: C14    Drugs for antipyretic, anodyne, anesthesia and central nervous system
Professional Classification: JC    Professional Standard - Building Material
Issued by: 0
Issued on: 2012-12-28
Implemented on: 2013-6-1
Status: valid
Language: English
File Format: PDF
Word Count: 4000 words
Price(USD): 120.0
Delivery: via email in 1~3 business day
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