Standard No.:	GB/T 26066-2010
English Name:	Practice for shallow etch pit detection on silicon
Chinese Name:	硅晶片上浅腐蚀坑检测的测试方法
Chinese Classification:	H80    Semimetal and semiconductor material in general
Professional Classification:	GB    National Standard
ICS Classification:	29.045 29.045    Semiconducting materials 29.045
Issued by:	AQSIQ
Issued on:	2011-1-1
Implemented on:	2011-10-1
Status:	valid
Language:	English
File Format:	PDF
Word Count:	4000 words
Price(USD):	120.00
Delivery:	via email in 1~3 business day

本标准规定了用热氧化和化学择优腐蚀技术检验抛光片或外延片表面因沾污造成的浅腐蚀坑的检测方法。
本标准适用于检测<111>或<100>晶向的p型或n型抛光片或外延片,电阻率大于0.001Ω·cm。