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Standard
| GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer (English Version) |
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Detail of GB/T 29505-2013
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Introduction of GB/T 29505-2013
本标准提供了硅片表面粗糙度测量常用的轮廓仪、干涉仪、散射仪三类方法的测量原理、测量设备和程序,并规定了硅片表面局部或整个区域的标准扫描位置图形及粗糙度缩写定义。
本标准适用于平坦硅片表面的粗糙度测量;也可用于其他类型的平坦晶片材料,但不适用于晶片边缘区域的粗糙度测量。
本标准不适用于带宽空间波长≤10nm 的测量仪器。
Contents of GB/T 29505-2013