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Position: Chinese Standard in English/GB/T 6616-2009 |
GB/T 6616-2009 Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge (English Version) | |||
Standard No.: | GB/T 6616-2009 | Status: | superseded remind me the status change
Email: |
Language: | English | File Format: | |
Word Count: | 6000 words | Price(USD): | 150.0 remind me the price change
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Implemented on: | 2010-6-1 | Delivery: | via email in 1~3 business day |
Standard No.: | GB/T 6616-2009 |
English Name: | Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge |
Chinese Name: | 半导体硅片电阻率及硅薄膜薄层电阻测试方法 非接触涡流法 |
Chinese Classification: | H80 Semimetal and semiconductor material in general |
Professional Classification: | GB National Standard |
ICS Classification: | 29.045 29.045 Semiconducting materials 29.045 |
Issued by: | AQSIQ; SAC |
Issued on: | 2009-10-30 |
Implemented on: | 2010-6-1 |
Status: | superseded |
Superseded by: | GB/T 6616-2023 Test method for resistivity of semiconductor wafers and sheet resistance of semiconductor films—Noncontact eddy-current gauge |
Superseded on: | 2024-3-1 |
Superseding: | GB/T 6616-1995 Test method for measuring resistivity of semiconductor silicon or sheet resistance of semiconductor films with a noncontact eddy-current gage |
Language: | English |
File Format: | |
Word Count: | 6000 words |
Price(USD): | 150.0 |
Delivery: | via email in 1~3 business day |
GB/T 6616-2009 Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge (English Version) | |||
Standard No. | GB/T 6616-2009 | ||
Status | superseded | ||
Language | English | ||
File Format | |||
Word Count | 6000 words | ||
Price(USD) | 150.0 | ||
Implemented on | 2010-6-1 | ||
Delivery | via email in 1~3 business day |
Standard No. |
GB/T 6616-2009 |
English Name |
Test methods for measuring resistivity of semiconductor wafers or sheet resistance of semiconductor films with a noncontact eddy-current gauge |
Chinese Name |
半导体硅片电阻率及硅薄膜薄层电阻测试方法 非接触涡流法 |
Chinese Classification |
H80 |
Professional Classification |
GB |
ICS Classification |
Issued by |
AQSIQ; SAC |
Issued on |
2009-10-30 |
Implemented on |
2010-6-1 |
Status |
superseded |
Superseded by |
GB/T 6616-2023 Test method for resistivity of semiconductor wafers and sheet resistance of semiconductor films—Noncontact eddy-current gauge |
Superseded on |
2024-3-1 |
Abolished on |
Superseding |
GB/T 6616-1995 Test method for measuring resistivity of semiconductor silicon or sheet resistance of semiconductor films with a noncontact eddy-current gage |
Language |
English |
File Format |
Word Count |
6000 words |
Price(USD) |
150.0 |
Keywords |
GB/T 6616-2009, GB 6616-2009, GBT 6616-2009, GB/T6616-2009, GB/T 6616, GB/T6616, GB6616-2009, GB 6616, GB6616, GBT6616-2009, GBT 6616, GBT6616 |
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Keywords: | ||
GB/T 6616-2009, GB 6616-2009, GBT 6616-2009, GB/T6616-2009, GB/T 6616, GB/T6616, GB6616-2009, GB 6616, GB6616, GBT6616-2009, GBT 6616, GBT6616 |