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Chinese National Standard Category: Metallographic testing method |
English Title: | Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection |
Chinese Title: | 硅抛光片和外延片表面质量光反射测试方法 |
Standard No.: | GB/T 17169-1997 |
Category No.: | H24 |
Issued by: | SBTS |
Issued on: | 1997-01-02 |
Implemented on: | 1998-8-1 |
Status: | abolished |
Superseded by: | |
Superseded on: | |
Abolished on: | 2005-10-14 |
Superseding: | |
Word Count: | 4500 words |
Similar Standards: | GB/T 10561-2023 GB/T 13299-2022 GB/T 30834-2022 GB/T 41080-2021 GB/T 40404-2021 GB/T 40304-2021 GB/T 40281-2021 GB/T 40067-2021 GB/T 39077-2020 GB/T 31309-2020 GB/T 37787-2019 GB/T 37793-2019 GB/T 224-2019 GB/T 37598-2019 GB/T 36591-2018 GB/T 15711-2018 GB/T 36165-2018 GB/T 34474.2-2018 GB/T 34474.1-2017 GB/T 6394-2017 |
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