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Position: Chinese Standard in English/GB/T 17169-1997 |
GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection (English Version) | |||
Standard No.: | GB/T 17169-1997 | Status: | abolished |
Language: | English | File Format: | |
Word Count: | 4500 words | Price(USD): | 380.00 remind me the price change |
Implemented on: | 1998-8-1 | Delivery: | via email in 1~3 business day |
Standard No.: | GB/T 17169-1997 |
English Name: | Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection |
Chinese Name: | 硅抛光片和外延片表面质量光反射测试方法 |
Chinese Classification: | H24 Metallographic testing method |
Professional Classification: | GB National Standard |
ICS Classification: | 29.045 Semiconducting materials |
Issued by: | SBTS |
Issued on: | 1997-01-02 |
Implemented on: | 1998-8-1 |
Status: | abolished |
Abolished on: | 2005-10-14 |
Language: | English |
File Format: | |
Word Count: | 4500 words |
Price(USD): | 380.00 |
Delivery: | via email in 1~3 business day |
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Keywords: | ||
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