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| Position: Chinese Standard in English/GB/T 24578-2024 |
| GB/T 24578-2024 Test method for measuring surface metal contamination on semiconductor wafers - Total reflection X-Ray fluorescence spectroscopy (English Version) | |||
| Standard No.: | GB/T 24578-2024 | Status: | valid remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 10500 words | Translation Price(USD): | 315.0 remind me the price change |
| Implemented on: | 2025-2-1 | Delivery: | via email in 1~5 business day |
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| Standard No.: | GB/T 24578-2024 |
| English Name: | Test method for measuring surface metal contamination on semiconductor wafers - Total reflection X-Ray fluorescence spectroscopy |
| Chinese Name: | 半导体晶片表面金属沾污的测定 全反射X射线荧光光谱法 |
| Chinese Classification: | H21 Metal physical property test method |
| Professional Classification: | GB National Standard |
| Source Content Issued by: | State Administration for Market Regulation; Standardization Administration of China |
| Issued on: | 2024-11-27 |
| Implemented on: | 2025-2-1 |
| Status: | valid |
| Superseding: | GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy GB/T 34504-2017 Measurement method for surface metal contamination on sapphire polished substrate wafer |
| Target Language: | English |
| File Format: | |
| Word Count: | 10500 words |
| Translation Price(USD): | 315.0 |
| Delivery: | via email in 1~5 business day |