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| Position: Chinese Standard in English/GB/T 43894.1-2024 |
| GB/T 43894.1-2024 Practice for determining semiconductor wafer near-edge geometry—Part 1:Measured height data array using a curvature metric（ZDD） (English Version) | |||
| Standard No.: | GB/T 43894.1-2024 | Status: | valid remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 6500 words | Translation Price(USD): | 195.0 remind me the price change |
| Implemented on: | 2024-11-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 43894.1-2024 |
| English Name: | Practice for determining semiconductor wafer near-edge geometry—Part 1:Measured height data array using a curvature metric（ZDD） |
| Chinese Name: | 半导体晶片近边缘几何形态评价 第1部分：高度径向二阶导数法（ZDD） |
| Chinese Classification: | H21 Metal physical property test method |
| Professional Classification: | GB National Standard |
| Source Content Issued by: | SAMR; SAC |
| Issued on: | 2024-4-25 |
| Implemented on: | 2024-11-1 |
| Status: | valid |
| Target Language: | English |
| File Format: | |
| Word Count: | 6500 words |
| Translation Price(USD): | 195.0 |
| Delivery: | via email in 1~3 business day |