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| Position: Chinese Standard in English/YS/T 15-1991 |
| YS/T 15-1991 Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method (English Version) | |||
| Standard No.: | YS/T 15-1991 | Status: | superseded |
| Language: | English | File Format: | |
| Word Count: | 3000 words | Price(USD): | 90.00 remind me the price change |
| Implemented on: | 1992-6-1 | Delivery: | via email in 1~3 business day |
| Standard No.: | YS/T 15-1991 |
| English Name: | Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method |
| Chinese Name: | 硅外延层和扩散层厚度测定 磨角染色法 |
| Chinese Classification: | H82 Elemental semiconductor material |
| Professional Classification: | YS Professional Standard - Non-ferrous Metal |
| ICS Classification: | 29.045 Semiconducting materials |
| Implemented on: | 1992-6-1 |
| Status: | superseded |
| Superseded by: | YS/T 15-2015 Test method for thickness of epitaxial layers and diffused layers by angle lap stain |
| Superseded on: | 2015-10-1 |
| Language: | English |
| File Format: | |
| Word Count: | 3000 words |
| Price(USD): | 90.00 |
| Delivery: | via email in 1~3 business day |