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YS/T 15-1991   Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method (English Version)
Standard No.: YS/T 15-1991 Status:superseded remind me the status change
Language:English File Format:PDF
Word Count: 3000 words Price(USD):90.0 remind me the price change
Implemented on:1992-6-1 Delivery: via email in 1~3 business day
Standard No.: YS/T 15-1991
English Name: Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method
Chinese Name: 硅外延层和扩散层厚度测定 磨角染色法
Chinese Classification: H82    Elemental semiconductor material
Professional Classification: YS    Professional Standard - Non-ferrous Metal
ICS Classification: 29.045 29.045    Semiconducting materials 29.045
Issued by: 0
Implemented on: 1992-6-1
Status: superseded
Superseded by:YS/T 15-2015 Test method for thickness of epitaxial layers and diffused layers by angle lap stain
Superseded on:2015-10-1
Language: English
File Format: PDF
Word Count: 3000 words
Price(USD): 90.0
Delivery: via email in 1~3 business day
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