YS/T 666-2008 English Version, YS/T 666-2008 Chemical analysis emthods of gallium for industrial use - Determination of impurity elements - Inductively coupled plasma atomic emission spectrometric method (English Version)

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YS/T 666-2008 Chemical analysis emthods of gallium for industrial use - Determination of impurity elements - Inductively coupled plasma atomic emission spectrometric method (English Version)
Standard No.:	YS/T 666-2008	Status:	valid remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	3000 words	Translation Price(USD):	160.0 remind me the price change Email:
Implemented on:	2008-9-1	Delivery:	via email in 1~3 business day

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Standard No.:	YS/T 666-2008
English Name:	Chemical analysis emthods of gallium for industrial use - Determination of impurity elements - Inductively coupled plasma atomic emission spectrometric method
Chinese Name:	工业镓化学分析方法杂质素的测定电感耦合等离子体原子发射光谱法
Chinese Classification:	H12 Light metals and their alloys analysis method
Professional Classification:	YS Professional Standard - Non-ferrous Metal
ICS Classification:	77.120.99 77.120.99 Other non-ferrous metals and their alloys 77.120.99
Source Content Issued by:	MIIT
Issued on:	2008-3-12
Implemented on:	2008-9-1
Status:	valid
Target Language:	English
File Format:	PDF
Word Count:	3000 words
Translation Price(USD):	160.0
Delivery:	via email in 1~3 business day

Standard

YS/T 666-2008 Chemical analysis emthods of gallium for industrial use - Determination of impurity elements - Inductively coupled plasma atomic emission spectrometric method (English Version)
Standard No.	YS/T 666-2008
Status	valid
Language	English
File Format	PDF
Word Count	3000 words
Price(USD)	160.0
Implemented on	2008-9-1
Delivery	via email in 1~3 business day

Detail of YS/T 666-2008

Standard No.

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Introduction of YS/T 666-2008

本标准规定了工业镓中硅、钠、钾、镁、钙、铝含量的测定方法。
本标准适用于工业镓[99.9%≤ω(%)≤99.995%]中硅、钠、钾、镁、钙、铝含量的测定。

Contents of YS/T 666-2008

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