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| Chinese National Standard Category: Metal physical property test method |
| English Title: | Test method for measuring surface metal contamination on semiconductor wafers - Total reflection X-Ray fluorescence spectroscopy |
| Chinese Title: | 半导体晶片表面金属沾污的测定 全反射X射线荧光光谱法 |
| Standard No.: | GB/T 24578-2024 |
| Category No.: | H21 |
| Issued by: | |
| Issued on: | 2024-11-27 |
| Implemented on: | 2025-2-1 |
| Status: | to be valid |
| Superseded by: | |
| Superseded on: | |
| Abolished on: | |
| Superseding: | GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy GB/T 34504-2017 Measurement method for surface metal contamination on sapphire polished substrate wafer |
| Word Count: | 10500 words |
| Similar Standards: | GB 1552-1979 GB 5251-1985 GB/T 24578-2024 GB/T 43315-2023 GB/T 43313-2023 GB/T 43096-2023 GB/T 43092-2023 GB/T 23365-2023 GB/T 43093-2023 GB/T 42902-2023 GB/T 1555-2023 GB/T 42676-2023 GB/T 42905-2023 GB/T 42789-2023 GB/T 42907-2023 GB/T 6616-2023 GB/T 1553-2023 GB/T 42514-2023 GB/T 42544-2023 GB/T 41765-2022 |
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