Standard No.:	T/ICMTIA 5.2-2020
English Name:	ArF immersion photo resist for integrated circuits
Chinese Name:	集成电路用ArF浸没式光刻胶
Chinese Classification:	G64    Reagent and substance of high purity
Professional Classification:	T/    Social Organization Standard
ICS Classification:	29.045 29.045    Semiconducting materials 29.045
Source Content Issued by:	ICMTIA
Issued on:	2020-12-31
Implemented on:	2021-3-1
Status:	valid
Target Language:	English
File Format:	PDF

本文件规定了ArF浸没式光刻胶的要求、试验方法、检测标准及包装、运输、存储。
本文件适用于集成电路用ArF浸没式光刻胶。