2025-12-6 10.1.6.65
Code of China Chinese Classification Professional Classification ICS Classification Latest News Value-added Services

Position: Chinese Standard in English/GB/T 14863-1993
GB/T 14863-1993   test method for net carrier density in silicon epitaxial layers by voltage - Capacitance of gated and ungated diodes (English Version)
Standard No.: GB/T 14863-1993 Status:superseded remind me the status change

Email:

Target Language:English File Format:PDF
Word Count: 5000 words Translation Price(USD):150.0 remind me the price change

Email:

Implemented on:1994-10-1 Delivery: via email in 1~3 business day

→ → →

2014-08-15,2014-8-15,1994-10-1,1411381780540346A56C04165CCA4
Standard No.: GB/T 14863-1993
English Name: test method for net carrier density in silicon epitaxial layers by voltage - Capacitance of gated and ungated diodes
Chinese Name: 用栅控和非栅控二极管的电压-电容关系测定硅外延层中净载流子浓度的标准方法
Chinese Classification: L41    Semiconductor diode
Professional Classification: GB    National Standard
Source Content Issued by: AQSIQ
Issued on: 1993-1-2
Implemented on: 1994-10-1
Status: superseded
Superseded by:GB/T 14863-2013 Method for net carrier density in silicon epitaxial layers by voltage-capacitance of gated and ungated diodes
Superseded on:2014-8-15
Abolished on:2014-08-15
Target Language: English
File Format: PDF
Word Count: 5000 words
Translation Price(USD): 150.0
Delivery: via email in 1~3 business day
本标准规定了用栅控和非栅控二极管的电压电容关系测定硅外延层中净载流子浓度的原理、仪器与材料、样品制备、测量步骤和数据处理。本标准适用于外延层厚度不小于某一最小厚度值(见附录B)的相同或相反导电类型衬底上的n型或p型外延层,也适用于体材料。
Code of China
Standard
GB/T 14863-1993  test method for net carrier density in silicon epitaxial layers by voltage - Capacitance of gated and ungated diodes (English Version)
Standard No.GB/T 14863-1993
Statussuperseded
LanguageEnglish
File FormatPDF
Word Count5000 words
Price(USD)150.0
Implemented on1994-10-1
Deliveryvia email in 1~3 business day
Detail of GB/T 14863-1993
Standard No.
GB/T 14863-1993
English Name
test method for net carrier density in silicon epitaxial layers by voltage - Capacitance of gated and ungated diodes
Chinese Name
用栅控和非栅控二极管的电压-电容关系测定硅外延层中净载流子浓度的标准方法
Chinese Classification
L41
Professional Classification
GB
ICS Classification
Issued by
AQSIQ
Issued on
1993-1-2
Implemented on
1994-10-1
Status
superseded
Superseded by
GB/T 14863-2013 Method for net carrier density in silicon epitaxial layers by voltage-capacitance of gated and ungated diodes
Superseded on
2014-8-15
Abolished on
2014-08-15
Superseding
Language
English
File Format
PDF
Word Count
5000 words
Price(USD)
150.0
Keywords
GB/T 14863-1993, GB 14863-1993, GBT 14863-1993, GB/T14863-1993, GB/T 14863, GB/T14863, GB14863-1993, GB 14863, GB14863, GBT14863-1993, GBT 14863, GBT14863
Introduction of GB/T 14863-1993
本标准规定了用栅控和非栅控二极管的电压电容关系测定硅外延层中净载流子浓度的原理、仪器与材料、样品制备、测量步骤和数据处理。本标准适用于外延层厚度不小于某一最小厚度值(见附录B)的相同或相反导电类型衬底上的n型或p型外延层,也适用于体材料。
Contents of GB/T 14863-1993
About Us   |    Contact Us   |    Terms of Service   |    Privacy   |    Cancellation & Refund Policy   |    Payment
Tel: +86-10-8572 5655 | Fax: +86-10-8581 9515 | Email: coc@codeofchina.com | QQ: 672269886
Copyright: Beijing COC Tech Co., Ltd. 2008-2040
 
 
Keywords:
GB/T 14863-1993, GB 14863-1993, GBT 14863-1993, GB/T14863-1993, GB/T 14863, GB/T14863, GB14863-1993, GB 14863, GB14863, GBT14863-1993, GBT 14863, GBT14863