Standard No.:	GB/T 24578-2009
English Name:	Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
Chinese Name:	硅片表面金属沾污的全反射X光荧光光谱测试方法
Chinese Classification:	H80    Semimetal and semiconductor material in general
Professional Classification:	GB    National Standard
ICS Classification:	29.045 29.045    Semiconducting materials 29.045
Source Content Issued by:	AQSIQ;SAC
Issued on:	2009-10-30
Implemented on:	2010-6-1
Status:	superseded
Superseded by:	GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
Superseded on:	2017-1-1
Target Language:	English
File Format:	PDF
Word Count:	7000 words
Translation Price(USD):	210.0
Delivery:	via email in 1~3 business day

本标准规定了硅片表面金属沾污的全反射X 光荧光光谱测试方法,本方法使用单色X 光源全反射X 光荧光光谱的方法定量测定硅单晶抛光衬底表面层的元素面密度。
本标准适用于N 型和P型硅单晶抛光片、外延片等镜面抛光的硅片,尤其适用于清洗后硅片自然氧化层,或经化学方法生长的氧化层中沾污元素的面密度测定。