Standard No.:	GB/T 24582-2009
English Name:	Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
Chinese Name:	酸浸取 电感耦合等离子质谱仪测定多晶硅表面金属杂质
Chinese Classification:	H80    Semimetal and semiconductor material in general
Professional Classification:	GB    National Standard
ICS Classification:	29.045 29.045    Semiconducting materials 29.045
Source Content Issued by:	AQSIQ;SAC
Issued on:	2009-10-30
Implemented on:	2010-6-1
Status:	superseded
Superseded by:	GB/T 24582-2023 Test method for measuring surface metal impurity content of polycrystalline silicon—Acid extraction-inductively coupled plasma mass spectrometry method
Superseded on:	2024-3-1
Target Language:	English
File Format:	PDF
Word Count:	4000 words
Translation Price(USD):	120.0
Delivery:	via email in 1~3 business day

本标准规定了用酸从多晶硅块表面浸取金属杂质,并用电感耦合等离子质谱仪定量检测多晶硅表面上的金属杂质痕量分析方法。
本标准适用于碱金属、碱土金属和第一系列过渡元素如钠、钾、钙、铁、镍、铜、锌以及其他元素如铝的检测。
本标准适用于各种棒、块、粒、片状多晶表面金属污染物的检测。由于块、片或粒形状不规则,面积很难准确测定,故根据样品重量计算结果,使用的样品重量为50g~300g,检测限为0.01ng/mL。