GB/T 29505-2013 English Version, GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer (English Version)

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GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer (English Version)
Standard No.:	GB/T 29505-2013	Status:	valid remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	15000 words	Translation Price(USD):	430.0 remind me the price change Email:
Implemented on:	2014-2-1	Delivery:	via email in 1~3 business day

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Standard No.:	GB/T 29505-2013
English Name:	Test method for measuring surface roughness on planar surfaces of silicon wafer
Chinese Name:	硅片平坦表面的表面粗糙度测量方法
Chinese Classification:	H80 Semimetal and semiconductor material in general
Professional Classification:	GB National Standard
ICS Classification:	29.045 29.045 Semiconducting materials 29.045
Source Content Issued by:	AQSIQ;SAC
Issued on:	2013-5-9
Implemented on:	2014-2-1
Status:	valid
Target Language:	English
File Format:	PDF
Word Count:	15000 words
Translation Price(USD):	430.0
Delivery:	via email in 1~3 business day

Standard

GB/T 29505-2013 Test method for measuring surface roughness on planar surfaces of silicon wafer (English Version)
Standard No.	GB/T 29505-2013
Status	valid
Language	English
File Format	PDF
Word Count	15000 words
Price(USD)	430.0
Implemented on	2014-2-1
Delivery	via email in 1~3 business day

Detail of GB/T 29505-2013

Standard No.

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ICS Classification

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Introduction of GB/T 29505-2013

本标准提供了硅片表面粗糙度测量常用的轮廓仪、干涉仪、散射仪三类方法的测量原理、测量设备和程序,并规定了硅片表面局部或整个区域的标准扫描位置图形及粗糙度缩写定义。
本标准适用于平坦硅片表面的粗糙度测量;也可用于其他类型的平坦晶片材料,但不适用于晶片边缘区域的粗糙度测量。
本标准不适用于带宽空间波长≤10nm 的测量仪器。

Contents of GB/T 29505-2013

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