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| Position: Chinese Standard in English/YS/T 23-1992 |
| YS/T 23-1992 Thickness determination for silicon epitaxial layers - Stacking fault method (English Version) | |||
| Standard No.: | YS/T 23-1992 | Status: | superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 2000 words | Translation Price(USD): | 60.0 remind me the price change |
| Implemented on: | 1993-1-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | YS/T 23-1992 |
| English Name: | Thickness determination for silicon epitaxial layers - Stacking fault method |
| Chinese Name: | 硅外延层厚度测定 堆垛层错尺寸法 |
| Chinese Classification: | H80 Semimetal and semiconductor material in general |
| Professional Classification: | YS Professional Standard - Non-ferrous Metal |
| ICS Classification: | 29.045 Semiconducting materials |
| Source Content Issued by: | China Nonferrous Metals Industry Corporation |
| Issued on: | 1992-3-9 |
| Implemented on: | 1993-1-1 |
| Status: | superseded |
| Superseded by: | YS/T 23-2016 Test method for thickness of epitaxial layers-Stacking fault size |
| Superseded on: | 2016-9-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 2000 words |
| Translation Price(USD): | 60.0 |
| Delivery: | via email in 1~3 business day |